Featured products
Property | Value |
---|---|
Material | Fused Quartz / Synthetic Quartz |
SiO₂ Purity | ≥ 99.99% |
Working Temperature | ≤ 1200°C continuous, up to 1500°C short-term |
Light Transmittance | >90% in 190–2500 nm |
Thermal Expansion | 5.5 × 10⁻⁷ /°C |
Chemical Resistance | Excellent to acids and alkalis |
Standard Forms | Plates, Tubes, Rods, Discs, Wafers |
Custom Machining | Cutting, Drilling, Polishing, CNC Machining |
Our custom high-temperature quartz glass can be manufactured with tight dimensional tolerances, optical surface finishes, and complex geometries, making it suitable for both prototype development and high-volume industrial deployment.
Custom High-Purity Quartz Glass is a premium-grade, amorphous silica-based material renowned for its exceptional thermal stability, optical clarity, and chemical resistance. With a purity level exceeding 99.99% SiO₂, this material is widely used in industrial, laboratory, and semiconductor environments where reliability and precision are critical.
Unlike standard glass, fused quartz and synthetic quartz glass are manufactured through ultra-clean processes that eliminate metallic and organic impurities. As a result, they exhibit superior performance in high-temperature, UV-transmitting, and corrosive conditions.
Engineered for continuous operation up to 1200°C and short-term exposure up to 1500°C, this material is ideal for use in thermal processing, furnaces, high-temperature reactors, and semiconductor fabrication chambers. Its extremely low thermal expansion rate (5.5 × 10⁻⁷ /°C) ensures dimensional stability and crack resistance during thermal cycling.
Optical-grade quartz glass offers over 90% light transmittance in the 190–2500 nm wavelength range, including deep UV, visible, and IR spectrums. This makes it suitable for UV-transparent applications, laser systems, optical windows, and UV-curing systems.
With high resistance to acids (excluding hydrofluoric acid), alkalis, and corrosive gases, this glass is ideal for chemical vapor deposition (CVD) processes, etching chambers, and fluid handling in aggressive environments.
We offer high-purity quartz glass in a wide variety of shapes and sizes, including:
Each component is fabricated under ISO-class cleanroom conditions to ensure contamination-free performance.
Quartz glass is the material of choice for high-temperature crucibles, reaction vessels, burner tubes, and optical sensors in analytical chemistry, biotechnology, and materials science.
Its thermal shock resistance and chemical purity make quartz glass indispensable for lithography, plasma etching, diffusion, and oxidation processes. Our quartz wafers are widely used in semiconductor research and production.
With superior UV transparency, this material is used in spectroscopy cells, laser optics, UV-transmitting windows, and light guide components.
The glass’s ability to endure extreme temperatures without structural degradation makes it a safe and efficient material for observation windows, viewports, and reaction containment in vacuum or controlled atmosphere environments.
Due to its resistance to hydrothermal corrosion, quartz glass is a dependable choice for fluid flow components, gas analyzers, and chemical reactors exposed to acidic or alkaline media.
At TIHOTOPTICS, we are committed to delivering the highest-grade quartz glass components backed by engineering expertise, stringent quality assurance, and OEM flexibility. Our capabilities include:
We collaborate closely with clients across aerospace, photonics, energy, scientific research, and semiconductor sectors to supply custom quartz solutions that meet evolving application demands.
Yes. Our quartz glass is engineered for continuous operation at 1200°C, with the ability to withstand short bursts up to 1500°C without cracking or deforming.
We support full customization of dimensions and geometries, including wafers, tubes, domes, plates, rings, and multi-axis CNC machined parts to fit your application.
Absolutely. Our UV-transparent quartz glass maintains high light transmittance even in the deep UV range (190 nm), making it ideal for UV-optics and photolithography.
Yes. It has excellent chemical durability, withstanding strong acids (except HF) and alkalis, making it ideal for aggressive chemical environments.
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